SPbPU has patented a method for producing hydrophobic nanometer-thick layers with a wetting angle of at least 130°
SPbPU scientists have developed a unique method for producing hydrophobic layers. Scientists create a coating of fluorocarbon-containing gas on a nanometer scale using a method that minimizes the destruction of the substrate material.
Existing analogues of hydrophobic coating methods take longer and may lead to the destruction of the substrates.
The prototype of the proposed solution is a method for manufacturing substrates with a hydrophobic layer applied, including a step of exposing the substrate to a plasma glow discharge in the presence of gaseous fluorocarbon. The difference between the method proposed by SPbPU scientists is that during the process, the task and temperature control of the substrate holder are carried out, due to which it is possible to neutralize the destruction of the substrate.
The pressure in the reaction chamber during the process is maintained at 0.7 to 5 Pa, the temperature of the substrate holder is 20°C, the gas flow rate is in the range from 5 to 20 cm3/min, the bias voltage on the substrate holder is from −10 to −15 V, the power absorbed in the discharge is in the range from 250 to 1250 Tue. The hydrophobic fluorocarbon coating obtained in the proposed method provides a surface wetting angle of at least 130°.
Another advantage of the invention is the reduction of coating time: the minimum possible deposition time of hydrophobic nanometer—thick layers in this method is 30 seconds and is selected depending on the substrate material and the desired thickness of the resulting hydrophobic layer.